Chemical Vapor Deposition chamber/Furnace controlled in temperature and pressure

Ionvac (partially custom made)

Instrument description
Chemical Vapor Deposition chamber/Furnace controlled in temperature and pressure
Description and functionality
Chemical Vapor Deposition (CVD) chamber for synthesis of carbon nanostructures, used in particular for the synthesis of vertically aligned carbon nanotubes (VA-CNTS). This CVD chamber can be also exploited as a furnace in high vacuum conditions and controlled in temperature.
location and contact persons
Contact person
Laboratory denomination
Nuovi Rivelatori
Department or Institution
Fisica
Building
CU004
Floor
Ground floor
Room
64
Sapienza institutional funding (Finanziamento di Ateneo)
other Sapienza research funding
safety notes
Safety data notes
Use of explosive gases
Chemical fume hoods
No
Air extraction system
Yes (working)
Air intake system
No
Safety cabinet
No